ALEXANDRIA, Va., July 8 -- Advanced Energy Industries, Fort Collins, Colorado, has been assigned a patent (No. 10,707,055, initially filed Nov. 16, 2018) by three co-inventors for "spatial and temporal control of ion bias voltage for plasma processing." The co-inventors are Denis Shaw, Fort Collins, Colorado, Kevin Fairbairn, Los Gatos, California, and Daniel Carter, Fort Collins, Colorado.

The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=P . . .