Japanese Inventors Develop Semiconductor Device
Copyright © Targeted News Service 2008
2008-10-29
ALEXANDRIA, Va., Oct. 29 -- Mitsuhiro Ichijo, Taketomi Asami and Noriyoshi Suzuki, all from Atsugi, Japan, have developed a method of manufacturing semiconductor device.
According to a description of the invention, released by the U.S. Patent & Trademark Office: "The present invention relates to a method of manufacturing a semiconductor device using a gettering technique. In particular, the present invention relates to a method of manufacturing a semiconductor device using a semic . . .
According to a description of the invention, released by the U.S. Patent & Trademark Office: "The present invention relates to a method of manufacturing a semiconductor device using a gettering technique. In particular, the present invention relates to a method of manufacturing a semiconductor device using a semic . . .
