Wednesday - March 25, 2026

Backside Deep Trench Isolation Structure for Leakage Suppression

2026-03-24

ALEXANDRIA, Virginia, March 24 -- OMNIVISION TECHNOLOGIES, INC., Santa Clara, California has been assigned a patent (No. US 12588302 B2, initially filed May 16, 2023) developed by three inventors Chun-Yung Ai, San Jose, California; Kazufumi Watanabe, Mountain View, California; and Chih-Wei Hsiung, San Jose, California, for "Backside deep trench isolation structure for leakage suppression." . . .

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Backside Deep Trench Isolation Structure for Leakage Suppression

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