Saturday - March 21, 2026

Composition, Method of Forming Resist Underlayer Film, and Method of Forming Resist Pattern

2026-03-10

ALEXANDRIA, Virginia, March 10 -- JSR CORPORATION, Tokyo, Japan has been assigned a patent (No. US 12572075 B2, initially filed Sept. 12, 2022) developed by six inventors Yugaku Takagi, Tokyo, Japan; Tsubasa Abe, Tokyo, Japan; Takashi Katagiri, Tokyo, Japan; Satoshi Dei, Tokyo, Japan; Kazunori Takanashi, Tokyo, Japan; and Yuya Hayashi, Tokyo, Japan, for "Composition, method of forming resist underlayer film, and method of forming resist pattern." . . .

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Composition, Method of Forming Resist Underlayer Film, and Method of Forming Resist Pattern

Information Request Form

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