U.S. Air Force to Grant Patent License to Ravee Optics
February 11, 2026
February 11, 2026
WASHINGTON, Feb. 11 (TNSFR) -- The U.S. Air Force announced its intent to grant a patent license to Ravee Optics Inc., Oakwood, Ohio, for a technology involving wafer-scale metamaterial structures. The corporation will receive a partially exclusive license focused on imaging and communication using infrared wavelengths.
The technology stems from U.S. Application No. 19/452,480, filed Jan. 19, 2026. This invention provides a method for forming metamaterial components by aligning spec . . .
The technology stems from U.S. Application No. 19/452,480, filed Jan. 19, 2026. This invention provides a method for forming metamaterial components by aligning spec . . .