NEW YORK, Aug. 17 -- The Journal of Vacuum Science and Technology A, a peer reviewed journal from the American Vacuum Society that says it covers interfaces and surfaces of materials, thin films and plasmas, published research articles on the following topics in its September 2024 edition (Vol. 42, Issue 5):

Letters

* Influence of high-temperature thermal annealing on paramagnetic point defects in silicon-rich silicon nitride films formed in a single-wafer-type low-pres . . .

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