BERLIN, Germany, April 7 -- Plasma Processes and Polymers, a peer-reviewed journal that says it covers fundamental and applied research in materials science, physics, chemistry and engineering in the area of plasma sources and plasma-based treatments, published research articles on the following topics in its April 2023 edition:

FEATURE ARTICLE:

* Amorphous silicon carbonitride (a-SiCN) thin film coatings by remote plasma chemical vapor deposition using organosilicon p . . .

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