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Journal of Vacuum Science & Technology A Issues Research Articles in May 2022 Edition
April 11, 2022

WASHINGTON, April 11 -- The Journal of Vacuum Science and Technology A, a peer reviewed journal that says it covers interfaces and surfaces of materials, thin films and plasmas, published research articles on the following topics in its May 2022 edition:

Atomic Layer Deposition (ALD):

* Flexible atomic layer deposition system for coating porous materials

* Plasma-enhanced atomic layer deposition of aluminum-indium oxide thin films and associated device app . . .

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