BERLIN, Germany, April 7 -- Plasma Processes and Polymers, a peer-reviewed journal that says it covers fundamental and applied research in materials science, physics, chemistry and engineering in the area of plasma sources and plasma-based treatments, published research articles, including the following topics, in its April 2021 edition:

REVIEWS:

* Hard silicon carbonitride thin-film coatings by remote hydrogen plasma chemical vapor deposition using aminosilane and sila . . .

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