New Argonne Etching Technique Could Advance the Way Semiconductor Devices are Made
February 13, 2020
February 13, 2020
ARGONNE, Illinois, Feb. 13 -- The U.S. Department of Energy's Argonne National Laboratory issued the following news release on Feb. 12:
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- Novel technique for advancing the way semiconductors are made
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Microelectronics like semiconductor devices are at the heart of the technologies we use each day. As we move into an era where we are stretching the limits of Moore's Law, it is essential to find new ways to continue to pack m . . .
* * *
- Novel technique for advancing the way semiconductors are made
* * *
Microelectronics like semiconductor devices are at the heart of the technologies we use each day. As we move into an era where we are stretching the limits of Moore's Law, it is essential to find new ways to continue to pack m . . .