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BASF Assigned Patent for Sulphonium Salt Photoinitiators

2011-09-11

ALEXANDRIA, Va., Sept. 11 -- BASF, Ludwigshafen, Germany, has been assigned a patent (8,012,672) developed by Pascal Hayoz, Hofstetten, Switzerland, Jean-Luc Birbaum, Binningen, Switzerland, and Stephan Ilg, Giebenach, Switzerland, for a sulphonium salt photoinitiators.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "Compounds of the formula (I), wherein L.sub.1, L.sub.2, L.sub.3 and L.sub.4 independently of one another are hydrogen or an orga . . .

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BASF Assigned Patent for Sulphonium Salt Photoinitiators

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