Sunday - December 22, 2024

Training of Machine Learning-Based Inverse Lithography Technology for Mask Synthesis With Synthetic Pattern Generation

2024-12-17

ALEXANDRIA, Virginia, Dec. 17 -- SIEMENS INDUSTRY SOFTWARE INC., Plano, Texas has been assigned a patent (No. US 12169674 B2, initially filed Aug. 30, 2021) developed by Nataraj Akkiraju, Fremont, California, and Ilhami Torunoglu, San Jose, California, for "Training of machine learning-based inverse lithography technology for mask synthesis with synthetic pattern generation." . . .

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Training of Machine Learning-Based Inverse Lithography Technology for Mask Synthesis With Synthetic Pattern Generation

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