Saturday - December 21, 2024

Dual Contact Process With Stacked Metal Layers

2024-12-17

ALEXANDRIA, Virginia, Dec. 17 -- INTEL CORPORATION, Santa Clara, California has been assigned a patent (No. US 12170319 B2, initially filed Sept. 25, 2020) developed by seven inventors Kevin Cook, Portland, Oregon; Anand S. Murthy, Portland, Oregon; Gilbert Dewey, Beaverton, Oregon; Nazila Haratipour, Hillsboro, Oregon; Ralph Thomas Troeger, Portland, Oregon; Christopher J. Jezewski, Portland, Oregon; and I-Cheng Tung, Hillsboro, Oregon, for "Dual contact process with stacked metal layers." . . .

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Dual Contact Process With Stacked Metal Layers

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