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Topological Simulation of Layout Design

2024-12-10

ALEXANDRIA, Virginia, Dec. 10 -- MICRON TECHNOLOGY, INC., Boise, Idaho has been assigned a patent (No. US 12164856 B2, initially filed Dec. 2, 2021) developed by Yorio Takada, Tokyo, Japan, for "Topological simulation of layout design." . . .

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Topological Simulation of Layout Design

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