Sunday - December 22, 2024

System for Continuous Atomic Layer Deposition

2024-12-10

ALEXANDRIA, Virginia, Dec. 10 -- UCHICAGO ARGONNE, LLC, Chicago, Illinois has been assigned a patent (No. US 12163221 B2, initially filed Feb. 7, 2017) developed by three inventors Jeffrey W. Elam, Elmhurst, Illinois; Angel Yanguas-Gil, Naperville, Illinois; and Joseph A. Libera, Clarendon Hills, Illinois, for "System for continuous atomic layer deposition." . . .

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