Sunday - December 22, 2024

Substrate Processing Method, Substrate Processing Apparatus, and Method for Producing Nanowire or Nanosheet Transistor

2024-12-10

ALEXANDRIA, Virginia, Dec. 10 -- TOKYO ELECTRON LIMITED, Tokyo, Japan has been assigned a patent (No. US 12165848 B2, initially filed Oct. 15, 2020) developed by four inventors Kenichi Oyama, Narisaki, Japan; Shohei Yamauchi, Narisaki, Japan; Kazuya Dobashi, Hillsboro, Oregon; and Akitaka Shimizu, Narisaki, Japan, for "Substrate processing method, substrate processing apparatus, and method for producing nanowire or nanosheet transistor." . . .

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Substrate Processing Method, Substrate Processing Apparatus, and Method for Producing Nanowire or Nanosheet Transistor

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