Sunday - December 22, 2024

Nanosheet Channel-To-Source and Drain Isolation

2024-12-10

ALEXANDRIA, Virginia, Dec. 10 -- ADEIA SEMICONDUCTOR SOLUTIONS LLC, San Jose, California has been assigned a patent (No. US 12166110 B2, initially filed April 12, 2023) developed by six inventors Marc A. Bergendahl, Troy, New York; Kangguo Cheng, Schenectady, New York; Fee Li Lie, Albany, New York; Eric R. Miller, Schenectady, New York; John R. Sporre, Albany, New York; and Sean Teehan, Rensselaer, New York, for "Nanosheet channel-to-source and drain isolation." . . .

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Nanosheet Channel-To-Source and Drain Isolation

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