Stacked Nanosheet Gate-All-Around Device Structures
Copyright © Targeted News Service 2024
2024-12-10
ALEXANDRIA, Virginia, Dec. 10 -- INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, New York has been assigned a patent (No. US 12166042 B2, initially filed Oct. 15, 2021) developed by three inventors Nicolas Loubet, Guilderland, New York; Huiming Bu, Glenmont, New York; and Balasubramanian Pranatharthiharan, Santa Clara, California, for "Stacked nanosheet gate-all-around device structures." . . .