Monday - December 23, 2024

Semiconductor Device Having Word Line Embedded in Gate Trench

2024-11-26

ALEXANDRIA, Virginia, Nov. 26 -- MICRON TECHNOLOGY, INC., Boise, Idaho has been assigned a patent (No. US 12156398 B2, initially filed Dec. 13, 2021) developed by Toshiyasu Fujimoto, Higashihiroshima, Japan, and Yoshihiro Matsumoto, Kobe, Japan, for "Semiconductor device having word line embedded in gate trench." . . .

Information Request Form

Name:
Category that best fits the type of business or agency you are affiliated with:	Government Newspaper / Media Business Public Policy Individual / Student Educators
Company Name:
Email:
Phone:
State:

I'd like to have a copy of this article mailed to me.

To also receive a free sample of other Targeted News products check the appropriate boxes below.
Golf Handicap site (FairwayFiles.com)
Products marked with ** can be customized by keywords or areas of interest. If you select them please specify your keywords in the box below:

If we need to contact you please specify your preferred contact method. Have a representative contact me by phone
Have a representative contact me via email

Additonal questions or comments:

Click here for more information or a free trial

Existing Customer Login

Semiconductor Device Having Word Line Embedded in Gate Trench

Information Request Form

Copyright Targeted News Service 2024