Monday - December 23, 2024

Nanofabrication Method With Correction of Distortion Within an Imprint System

2024-11-26

ALEXANDRIA, Virginia, Nov. 26 -- CANON KABUSHIKI KAISHA, Tokyo, Japan has been assigned a patent (No. US 12153342 B2, initially filed Aug. 30, 2022) developed by Se-Hyuk Im, Austin, Texas, and Anshuman Cherala, Austin, Texas, for "Nanofabrication method with correction of distortion within an imprint system." . . .

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Nanofabrication Method With Correction of Distortion Within an Imprint System

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