Monday - December 23, 2024

Layout Marking System for Tracing Reference Regions in a Construction Layout and a Method Thereof

2024-11-26

ALEXANDRIA, Virginia, Nov. 26 -- Two inventors, Rigoberto Renteria, El Paso, Texas, and Heber Renteria, Horizon, Texas, have been awarded a patent (No. US 12152879 B1, initially filed July 30, 2024) for "Layout marking system for tracing reference regions in a construction layout and a method thereof." . . .

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Layout Marking System for Tracing Reference Regions in a Construction Layout and a Method Thereof

Information Request Form

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