Systems and Methods for Electron Beam Focusing in Electron Beam Additive Manufacturing
Copyright © Targeted News Service 2024
2024-11-19
ALEXANDRIA, Virginia, Nov. 19 -- GENERAL ELECTRIC COMPANY, Evendale, Ohio has been assigned a patent (No. US 12148592 B2, initially filed Oct. 30, 2023) developed by five inventors John Scott Price, Niskayuna, New York; Ye Bai, Niskayuna, New York; Antonio Caiafa, Schenectady, New York; Vasile Bogdan Neculaes, Niskayuna, New York; and Uwe Wiedmann, Clifton Park, New York, for "Systems and methods for electron beam focusing in electron beam additive manufacturing." . . .