Tuesday - December 24, 2024

Inorganic-Infiltrated Polymer Hybrid Thin Film Resists for Advanced Lithography

2024-11-12

ALEXANDRIA, Virginia, Nov. 12 -- THE RESEARCH FOUNDATION FOR THE STATE UNIVERSITY OF NEW YORK, Albany, New York has been assigned a patent (No. US 12140865 B2, initially filed March 4, 2020) developed by seven inventors Chang-Yong Nam, Stony Brook, New York; Aaron Stein, Huntington Station, New York; Ming Lu, Stony Brook, New York; Jiyoung Kim, Plano, Texas; Nikhil Tiwale, Medford, New York; Su Min Hwang, Plano, Texas; and Ashwanth Subramanian, Stony Brook, New York, for "Inorganic-infiltrated . . .

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Inorganic-Infiltrated Polymer Hybrid Thin Film Resists for Advanced Lithography

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