Wednesday - December 25, 2024

Spectrometric Metrology Systems Based on Multimode Interference and Lithographic Apparatus

2024-11-05

ALEXANDRIA, Virginia, Nov. 5 -- ASML HOLDING N.V., Veldhoven, Netherlands has been assigned a patent (No. US 12135505 B2, initially filed June 29, 2021) developed by three inventors Mohamed Swillam, Wilton, Connecticut; Justin Lloyd Kreuzer, Trumbull, Connecticut; and Stephen Roux, New Fairfield, Connecticut, for "Spectrometric metrology systems based on multimode interference and lithographic apparatus." . . .

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Spectrometric Metrology Systems Based on Multimode Interference and Lithographic Apparatus

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