Plasma Processing System and Method Using Radio Frequency and Microwave Power
Copyright © Targeted News Service 2024
2024-10-29
ALEXANDRIA, Virginia, Oct. 29 -- TOKYO ELECTRON LIMITED, Tokyo, Japan has been assigned a patent (No. US 12131887 B2, initially filed May 4, 2021) developed by three inventors Yunho Kim, Cohes, New York; Yanxiang Shi, Clifton Park, New York; and Mingmei Wang, Albany, New York, for "Plasma processing system and method using radio frequency and microwave power." . . .