Thursday - December 26, 2024

Techniques for Void-Free Material Depositions

2024-10-29

ALEXANDRIA, Virginia, Oct. 29 -- APPLIED MATERIALS, INC., Santa Clara, California has been assigned a patent (No. US 12131948 B2, initially filed July 21, 2023) developed by five inventors M. Arif Zeeshan, Manchester, Massachusetts; Kelvin Chan, San Ramon, California; Shantanu Kallakuri, Ithaca, New York; Sony Varghese, Manchester, Massachusetts; and John Hautala, Beverly, Massachusetts, for "Techniques for void-free material depositions." . . .

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Techniques for Void-Free Material Depositions

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