Thursday - December 26, 2024

Advanced Etching Technologies for Straight, Tall and Uniform Fins Across Multiple Fin Pitch Structures

2024-10-29

ALEXANDRIA, Virginia, Oct. 29 -- INTEL CORPORATION, Santa Clara, California has been assigned a patent (No. US 12131912 B2, initially filed Dec. 6, 2023) developed by three inventors Muralidhar S. Ambati, Hillsboro, Oregon; Ritesh Jhaveri, Hillsboro, Oregon; and Moosung Kim, Portland, Oregon, for "Advanced etching technologies for straight, tall and uniform fins across multiple fin pitch structures." . . .

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Advanced Etching Technologies for Straight, Tall and Uniform Fins Across Multiple Fin Pitch Structures

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