Friday - December 27, 2024

Lithographic Apparatus, Metrology Systems, Illumination Sources and Methods Thereof

2024-10-22

ALEXANDRIA, Virginia, Oct. 22 -- ASML NETHERLANDS B.V. & ASML HOLDING N.V., Veldhoven, Netherlands has been assigned a patent (No. US 12124173 B2, initially filed Dec. 8, 2020) developed by Marinus Petrus Reijnders, Eindhoven, Netherlands, and Mohamed Swillam, Wilton, Connecticut, for "Lithographic apparatus, metrology systems, illumination sources and methods thereof." . . .

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Lithographic Apparatus, Metrology Systems, Illumination Sources and Methods Thereof

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