Friday - December 27, 2024

Catalytic Abatement System for Semiconductor Manufacturing Process

2024-10-22

ALEXANDRIA, Virginia, Oct. 22 -- GLOBALFOUNDRIES U.S. INC., Malta, New York has been assigned a patent (No. US 12121855 B1, initially filed March 15, 2024) developed by Justin M. Weinstein, Clifton Park, New York, for "Catalytic abatement system for semiconductor manufacturing process." . . .

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Catalytic Abatement System for Semiconductor Manufacturing Process

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