Friday - May 17, 2024

Dynamic Precursor Dosing for Atomic Layer Deposition

2024-04-30

ALEXANDRIA, Virginia, April 30 -- LAM RESEARCH CORPORATION, Fremont, California has been assigned a patent (No. US 11970772 B2, initially filed Oct. 20, 2021) developed by six inventors Purushottam Kumar, Hillsboro, Oregon; Adrien LaVoie, Newberg, Oregon; Jun Qian, Sherwood, Oregon; Hu Kang, Tualatin, Oregon; Ishtak Karim, San Jose, California; and Fung Suong Ou, Portland, Oregon, for "Dynamic precursor dosing for atomic layer deposition." . . .

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Dynamic Precursor Dosing for Atomic Layer Deposition

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