Microelectronic Devices With Dopant Extensions Near a GIDL Region Below a Tier Stack, and Related Methods and Systems
Copyright © Targeted News Service 2024
2024-04-30
ALEXANDRIA, Virginia, April 30 -- MICRON TECHNOLOGY, INC., Boise, Idaho has been assigned a patent (No. US 11974430 B2, initially filed Jan. 26, 2021) developed by three inventors Albert Fayrushin, Boise, Idaho; Haitao Liu, Boise, Idaho; and Chris M. Carlson, Nampa, Idaho, for "Microelectronic devices with dopant extensions near a GIDL region below a tier stack, and related methods and systems." . . .