Surface Cleaning
Copyright © Targeted News Service 2024
2024-04-30
ALEXANDRIA, Virginia, April 30 -- MICRON TECHNOLOGY, INC., Boise, Idaho has been assigned a patent (No. US 11969140 B2, initially filed June 22, 2021) developed by five inventors Priya Vemparala Guruswamy, Boise, Idaho; Chunhua Yao, Boise, Idaho; Anshika Sharma, Boise, Idaho; Xiao Li, Boise, Idaho; and Cipriana Forgy, Meridian, Idaho, for "Surface cleaning." . . .