Atomic Layer Deposition of Metal Films
Copyright © Targeted News Service 2024
2024-04-30
ALEXANDRIA, Virginia, April 30 -- LAM RESEARCH CORPORATION, Fremont, California has been assigned a patent (No. US 11970776 B2, initially filed Jan. 27, 2020) developed by five inventors Joshua Collins, Sunnyvale, California; Griffin John Kennedy, San Leandro, California; Hanna Bamnolker, Cupertino, California; Patrick A. van Cleemput, San Jose, California; and Seshasayee Varadarajan, Lake Oswego, Oregon, for "Atomic layer deposition of metal films." . . .