Organometallic Solution Based High Resolution Patterning Compositions
Copyright © Targeted News Service 2024
2024-04-23
ALEXANDRIA, Virginia, April 24 -- INPRIA CORPORATION, Corvallis, Oregon has been assigned a patent (No. US 11966159 B2, initially filed Sept. 6, 2022) developed by five inventors Stephen T. Meyers, Corvallis, Oregon; Douglas A. Keszler, Corvallis, Oregon; Kai Jiang, Corvallis, Oregon; Jeremy T. Anderson, Corvallis, Oregon; and Andrew Grenville, Corvallis, Oregon, for "Organometallic solution based high resolution patterning compositions." . . .