Spectral Masks for Subchannel Puncturing in EHT Networks
Copyright © Targeted News Service 2024
2024-04-16
ALEXANDRIA, Virginia, April 16 -- INTEL CORPORATION, Santa Clara, California has been assigned a patent (No. US 11962406 B2, initially filed Dec. 17, 2020) developed by five inventors Xiaogang Chen, Portland, Oregon; Qinghua Li, San Ramon, California; Thomas J. Kenney, Portland, Oregon; Assaf Gurevitz, Ramat Hasharon, Israel; and Avishay Friedman, Petach Tikva, Israel, for "Spectral masks for subchannel puncturing in EHT networks." . . .