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Controlled Hydrolysis of Hazardous Silicon Polymer Residue

2024-04-16

ALEXANDRIA, Virginia, April 16 -- HIGH-PURITY SILICON CORPORATION, Yokkaichi, Japan has been assigned a patent (No. US 11958022 B2, initially filed Oct. 7, 2020) developed by four inventors Wes Teichmiller, Theodore, Alabama; Bryan H. Nettles, Theodore, Alabama; Mark Servos, Theodore, Alabama; and Matthias A. Colomb, Theodore, Alabama, for "Controlled hydrolysis of hazardous silicon polymer residue." . . .

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Controlled Hydrolysis of Hazardous Silicon Polymer Residue

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