Dual Hydrogen Barrier Layer for Trench Capacitors Integrated With Low Density Film for Logic Structures and Methods of Fabrication
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2024-04-09
ALEXANDRIA, Virginia, April 9 -- KEPLER COMPUTING INC., San Francisco, California has been assigned a patent (No. US 11955512 B1, initially filed Dec. 15, 2021) developed by nine inventors Somilkumar J. Rathi, San Jose, California; Noriyuki Sato, Hillsboro, Oregon; Niloy Mukherjee, San Ramon, California; Rajeev Kumar Dokania, Beaverton, Oregon; Amrita Mathuriya, Portland, Oregon; Tanay Gosavi, Portland, Oregon; Pratyush Pandey, Kensington, California; Jason Y. Wu, Albany, California; and Sasika . . .