Sunday - June 2, 2024

Plasma Processing With Radio Frequency (RF) Source and Bias Signal Waveforms

2024-03-26

ALEXANDRIA, Virginia, March 26 -- TOKYO ELECTRON LIMITED, Tokyo, Japan has been assigned a patent (No. US 11942307 B2, initially filed Oct. 15, 2021) developed by five inventors Zhiying Chen, Austin, Texas; Barton Lane, Tokyo, Japan; Yun Han, Albany, New York; Peter Lowell George Ventzek, Austin, Texas; and Alok Ranjan, Austin, Texas, for "Plasma processing with radio frequency (RF) source and bias signal waveforms." . . .

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Plasma Processing With Radio Frequency (RF) Source and Bias Signal Waveforms

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